| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for decreasing impurities contained in an organic polymer by a simple process when the organic polymer is patterned on a substrate and cured and a part of the organic polymer constituting the obtained pattern is vaporized by a chemical reaction. SOLUTION: After a part of the organic polymer patterned and cured on the substrate is vaporized by the chemical reaction, the resulting organic polymer is heat-treated at the temperature of≥100°C, cleaned by a basic aqueous solution or cleaned by an acidic aqueous solution to decrease impurities contained in the organic polymer. COPYRIGHT: (C)2009,JPO&INPIT |
