发明名称 液浸上層膜形成用組成物及びレジストパターン形成方法
摘要 The present invention is a composition which is for use in forming an overcoat film for immersion exposure and which comprises [A] a polymer component that contains a polymer (A1) and [B] a solvent, said polymer (A1) having structural units (I) that each contain a group represented by formula (1). In formula (1), R1 is an alkali-dissociable group, R2 is a (n+1)-valent linking group, and A is -CO-O-*, -SO2-O-*, an oxygen atom, or -NR3-, with the proviso that a case wherein A is an oxygen atom and the directly-A-bonded moiety of R2 is a carboxyl group or a sulfonyl group is excepted.
申请公布号 JP5935807(B2) 申请公布日期 2016.06.15
申请号 JP20130536101 申请日期 2012.08.29
申请人 JSR株式会社 发明人 草開 一憲;田中 希佳;羽山 孝弘;島 基之
分类号 G03F7/11;C08F16/24;C08F18/20;C08F20/26;C08F20/58;C08F28/02;H01L21/027 主分类号 G03F7/11
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