发明名称 LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate table having a sensor which resolves one or more existing difficulties. <P>SOLUTION: A substrate table comprises a sensor which includes a material block provided with a material layer opaque to radiation. The material layer has at least one window configured to permit transmission of radiation. The sensor comprises a wavelength conversion material located at the window, and a waveguide located so as to receive radiation emitted from the wavelength conversion material. The waveguide is embedded in the material block, and configured to direct the radiation emitted from the wavelength conversion material toward a detector through the material block. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013046048(A) 申请公布日期 2013.03.04
申请号 JP20110270171 申请日期 2011.12.09
申请人 ASML NETHERLANDS BV 发明人 PROSYENTSOV VITALIY;JOHANNES MARIA VAN BENTEN
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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