发明名称 BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF
摘要 Block copolymer nanostructures such as nanosheets, nanoribbons, and nanotubes, are provided. The nanotructures are formed by the self-assembly of block copolymers during evaporation of solvent from a sol that has been “disturbed”, either i) by the introduction of relief (e.g. curvature) and/or the inclusion of nanoparticles in the sol; or ii) externally, e.g. by physical deformation of a semi-solid form of the sol, or a combination of internal and external disturbance. The nanostructures have uses in, for example, energy devices, electronics, sensors and drug delivery applications.
申请公布号 US2016332869(A1) 申请公布日期 2016.11.17
申请号 US201415107647 申请日期 2014.12.18
申请人 WASHINGTON STATE UNIVERSITY 发明人 WANG Yu;ZHONG Wei-hong
分类号 B81C1/00;C08F299/04;C08G81/00 主分类号 B81C1/00
代理机构 代理人
主权项 1. A method of making solid state block copolymer nanostructures, comprising the steps of disturbing a top surface of a layer of a block copolymer sol; and evaporating fluid from said block copolymer sol to form one or more solid state block copolymer nanostructures.
地址 Pullman WA US