发明名称 |
Sputtering target for production of magnetic recording medium, method for producing magnetic recording medium using same, and magnetic recording medium |
摘要 |
The present invention provides a sputtering target for production of a magnetic recording medium including at least a nonmagnetic undercoat layer, a magnetic layer, and a protective layer laminated sequentially on a nonmagnetic substrate, the sputtering target being used for film formation of the magnetic layer, the sputtering target comprising a mixture of a metal and an oxide, and the particle diameter of the oxide in the sputtering target being 10 mum or less. The sputtering target suppresses abnormal discharge occurring during film formation of a granular magnetic layer of the magnetic recording medium, and suppresses occurrence of foreign objects on the magnetic recording medium.
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申请公布号 |
US2001044018(A1) |
申请公布日期 |
2001.11.22 |
申请号 |
US20010789928 |
申请日期 |
2001.02.22 |
申请人 |
UWAZUMI HIROYUKI;OIKAWA TADAAKI |
发明人 |
UWAZUMI HIROYUKI;OIKAWA TADAAKI |
分类号 |
C22C5/04;C23C14/06;C23C14/34;G11B5/64;G11B5/65;G11B5/851;H01F41/18;(IPC1-7):B32B5/16;C22C38/00;C23C14/16 |
主分类号 |
C22C5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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