POSITIVE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND

摘要

Disclosed is a positive resist composition containing a base component (A) with an acid-cleavable dissolution inhibiting group whose alkali solubility is increased by the action of an acid, and an acid generator component (B) which generates an acid when exposed to light. The base component (A) contains a compound (A1) which is obtained by substituting a part or all of hydrogen atoms of a phenolic hydroxyl group of a polyvalent phenolic compound, which has a molecular weight of 300-2500 and is represented by the general formula (I) below, with at least one group selected from the group consisting of acid-cleavable dissolution inhibiting groups (II) represented by the general formula (II) below and acid-cleavable dissolution inhibiting groups (III) represented by the general formula (III) below.