| 摘要 |
PROBLEM TO BE SOLVED: To form an antireflection film on a resist without using chlorofluorocarbons by incorporating a water-soluble polymer, at least one fluoroalkylsulfonic acid, at least one alkanolamine and at least one amide deriv. SOLUTION: This antireflection film material comprises an aq. soln. contg. a water-soluble polymer, at least one fluoroalkylsulfonic acid, at least one alkanolamine and at least one amide deriv. The water-soluble polymer acts chiefly as a base polymer, is preferably soluble even in a hydrophilic org. solvent and includes an N-vinylpyrrolidone/vinyl acetate copolymer. The fluoroalkylsulfonic acid is preferably a 4-12C fluoroalkylsulfonic acid excellent in compatibility with the water-soluble polymer. The alkanolamine is preferably a <=12C alkanolamine such as ethanolamine. The amide deriv. is preferably a <=8C amide deriv. such as formamide. |
