| 发明名称 |
EXTERNAL SUBSTRATE ROTATION IN A SEMICONDUCTOR PROCESSING SYSTEM |
| 摘要 |
A method and apparatus for processing a semiconductor is disclosed herein. In one embodiment, a processing system for semiconductor processing is disclosed. The processing chamber includes two transfer chambers, a processing chamber, and a rotation module. The processing chamber is coupled to the transfer chamber. The rotation module is positioned between the transfer chambers. The rotation module is configured to rotate the substrate. The transfer chambers are configured to transfer the substrate between the processing chamber and the transfer chamber. In another embodiment, a method for processing a substrate on the apparatus is disclosed herein. |
| 申请公布号 |
US2016315000(A1) |
申请公布日期 |
2016.10.27 |
| 申请号 |
US201615091260 |
申请日期 |
2016.04.05 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
NGUYEN Tuan Anh;BANSAL Amit Kumar;ROCHA-ALVAREZ Juan Carlos |
| 分类号 |
H01L21/67;H01L21/02;H01L21/66;H01L21/687 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A processing chamber for semiconductor processing, the processing chamber comprising:
two transfer chambers; a processing chamber coupled to one of the two transfer chamber; a rotation module positioned between the transfer chambers, the rotation module configured to rotate a substrate. |
| 地址 |
Santa Clara CA US |
