METHODS FOR FORMING PATTERN USING CYCLIC PROCESSING

摘要

A method for forming a vertical pattern includes forming a tungsten layer on a lower layer and performing a cyclic process including an etch process and an oxidation process on the tungsten layer to form a vertical pattern. Performing the cyclic process includes oxidizing the tungsten layer by an oxidation process using oxygen plasma to form a tungsten oxide layer and selectively etching the tungsten oxide layer by an etch process using a chlorine-based gas.

主权项

1. A method for forming a pattern, the method comprising:
forming a tungsten layer on a lower layer; and performing a cyclic process comprising an etch process and an oxidation process on the tungsten layer to form a vertical pattern, wherein performing the cyclic process comprises:
oxidizing the tungsten layer by the oxidation process using oxygen plasma to form a tungsten oxide layer; andselectively etching the tungsten oxide layer by the etch process using a chlorine-based gas, wherein each of the oxidation process and the etch process uses plasma generated by a first power applied to a top electrode and a second power applied to a bottom electrode, wherein the plasma used in the oxidation process is generated under a condition where the first power is greater than the second power, and wherein the plasma used in the etch process is generated under a condition where the second power is greater than the first power.