发明名称 |
IMPROVED APPARATUS FOR DECREASING SUBSTRATE TEMPERATURE NON-UNIFORMITY |
摘要 |
Embodiments of the present disclosure provide a cover assembly that includes a cover having a plurality of ports, and each port has a diameter of less than 1 mm, such as between about 0.1 mm to about 0.9 mm. The cover may be disposed between a device side surface of a substrate and a reflector plate, which are all disposed within a thermal processing chamber. The presence of the cover having the plurality of small ports within the thermal processing chamber will improve thermal uniformity over time after processing doped substrates. |
申请公布号 |
WO2016195984(A1) |
申请公布日期 |
2016.12.08 |
申请号 |
WO2016US32718 |
申请日期 |
2016.05.16 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MILLER, Aaron;TAM, Norman L.;LIU, Michael |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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