发明名称 Lithographic apparatus, device manufacturing method, and use of a radiation collector
摘要 A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period
申请公布号 US2007085043(A1) 申请公布日期 2007.04.19
申请号 US20050253054 申请日期 2005.10.19
申请人 ASML NETHERLANDS B.V. 发明人 LEONARDUS FRANKEN JOHANNES C.;STRUYCKEN ALEXANDER M.;MARIE VAN DEN SCHOOR LEON J.
分类号 G01J3/10 主分类号 G01J3/10
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