发明名称 METHOD FOR FORMING MICROPARTICLE PATTERN AND METHOD FOR PRODUCING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a microparticle pattern excellent in pattern controllability, pattern accuracy and productivity; and to provide a method for producing a single electron device, a magnetic recording medium, a chemical sensor, a quantum dot laser device or a photonic crystal optical device. <P>SOLUTION: The method for forming the microparticle pattern includes patternwise exposing a substrate 1 having a layer 5 formed on an uppermost surface thereof and containing a silane coupling agent having a thiol, amino, hydroxyl, carboxyl or sulfo group protected by a photodegradable protective group, and immersing the substrate in a colloidal solution in which metal atom-containing microparticles are dispersed to selectively deposit metal atom-containing microparticles 3 on an exposed portion 4. The method for producing a single electron device, a magnetic recording medium, a chemical sensor, a quantum dot laser device or a photonic crystal optical device using the microparticle pattern forming method is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007240981(A) 申请公布日期 2007.09.20
申请号 JP20060064666 申请日期 2006.03.09
申请人 CANON INC 发明人 ITO TOSHIKI
分类号 G03F7/004;G03F7/075;G03F7/38;H01L21/027 主分类号 G03F7/004
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