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发明名称
半导体装置及其制造方法
摘要
形成绝缘膜(3或1),其被覆于半导体构成体(2)之外部连接用电极(10a)上面,且在绝缘膜(3或1)上形成金属遮罩层(52,65),其形成有比外部连接用电极(10a)之平面尺寸还小的平面尺寸之开口部(53,64)。藉由将该金属遮罩层(52,65)作为遮罩而照射雷射光束于绝缘膜(3或1),在绝缘膜(3或1)形成抵达外部连接用电极(10a)之连接用开口部(13)。在绝缘膜(3或1)上形成配线(21)且使配线(21)透过连接用开口部(13)而连接于外部连接用电极(10a)。
申请公布号
TWI390696
申请公布日期
2013.03.21
申请号
TW098102360
申请日期
2009.01.22
申请人
兆装微股份有限公司 日本
发明人
定别当裕康
分类号
H01L23/52;H01L23/48;H01L21/786;H01L23/28
主分类号
H01L23/52
代理机构
代理人
何金涂 台北市大安区敦化南路2段77号8楼;丁国隆 台北市大安区敦化南路2段77号8楼
主权项
地址
日本
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