| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve a problem that, although smaller defects can be detected by using PSL having smaller grain sizes in a surface inspection device, however the grain size of PSL is limited, and there is still no consideration of a method for inspecting defects having smaller grain sizes which are not designated in the PSL which will be necessary in an inspection in a semiconductor manufacturing process in a near future, in a conventional surface inspection device. <P>SOLUTION: The inspection device has a light source device capable of generating light simulating at least one of a wavelength, light volume, temporal change in the light volume, and polarization of light which is scattered, diffracted, or reflected by an inspection object. The light is entered in a light detector of the surface inspection device to inspect minute defects. <P>COPYRIGHT: (C)2013,JPO&INPIT |
