发明名称 |
Pattern forming method, method for manufacturing electronic device, and electronic device |
摘要 |
There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern. |
申请公布号 |
US9405197(B2) |
申请公布日期 |
2016.08.02 |
申请号 |
US201514625782 |
申请日期 |
2015.02.19 |
申请人 |
FUJIFILM Corporation |
发明人 |
Shibuya Akinori;Kataoka Shohei;Matsuda Tomoki;Fukuhara Toshiaki;Goto Akiyoshi |
分类号 |
G03F7/004;G03F7/30;H01L21/027;C07C381/12;C08F220/18;C08F220/26;C08F220/24;C08F220/38;G03F7/039;G03F7/11;G03F7/20;G03F7/32;G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A pattern forming method comprising:
forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) an onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing its polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein: the onium salt compound (A) is a compound having a basic moiety containing a nitrogen atom in the cationic moiety; an electron-withdrawn group is not directly connected to the nitrogen atom in the basic moiety; and the basic moiety is a structure selected from the group consisting of a group resulting from removal of one hydrogen atom from a primary amine, a group resulting from removal of one hydrogen atom from a secondary amine, and a nitrogen-containing heterocyclic group. |
地址 |
Tokyo JP |