发明名称 |
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS |
摘要 |
A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer. |
申请公布号 |
US2016229940(A1) |
申请公布日期 |
2016.08.11 |
申请号 |
US201615015554 |
申请日期 |
2016.02.04 |
申请人 |
Shin-Etsu Chemical Co., Ltd. |
发明人 |
Hatakeyama Jun;Adachi Teppei;Funatsu Kenji |
分类号 |
C08F236/02;C08F222/14;C08F222/10;G03F7/30;C08F216/16;G03F7/038;G03F7/16;G03F7/20;C08F224/00;C08F216/10 |
主分类号 |
C08F236/02 |
代理机构 |
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代理人 |
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主权项 |
1. A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units of at least one type selected from recurring units having a carboxyl group optionally substituted with an acid labile group and recurring units having a hydroxyl group optionally substituted with an acid labile group,
said polymer being obtained from polymerization of monomers corresponding to the recurring units in a solution of a non-polymerizable compound containing at least one nitrogen atom to which at least one acid labile group is bound. |
地址 |
Tokyo JP |