发明名称 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
摘要 A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.
申请公布号 US2016229940(A1) 申请公布日期 2016.08.11
申请号 US201615015554 申请日期 2016.02.04
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 Hatakeyama Jun;Adachi Teppei;Funatsu Kenji
分类号 C08F236/02;C08F222/14;C08F222/10;G03F7/30;C08F216/16;G03F7/038;G03F7/16;G03F7/20;C08F224/00;C08F216/10 主分类号 C08F236/02
代理机构 代理人
主权项 1. A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units of at least one type selected from recurring units having a carboxyl group optionally substituted with an acid labile group and recurring units having a hydroxyl group optionally substituted with an acid labile group, said polymer being obtained from polymerization of monomers corresponding to the recurring units in a solution of a non-polymerizable compound containing at least one nitrogen atom to which at least one acid labile group is bound.
地址 Tokyo JP