PLASMA ETCHING EQUIPMENT AND METHOD FOR REMOVING RESIDUAL CHARGE IN THE EQUIPMENT,申请号KR20040103369-传众专利搜索

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发明名称	PLASMA ETCHING EQUIPMENT AND METHOD FOR REMOVING RESIDUAL CHARGE IN THE EQUIPMENT
摘要
申请公布号	KR20060064739(A)	申请公布日期	2006.06.14
申请号	KR20040103369	申请日期	2004.12.09
申请人	SEMES CO., LTD.	发明人	LEE, KI YUNG;KIM, HYUNG JOON;SEO, JAE WON
分类号	H01L21/3065	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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