发明名称 METHOD OF PRODUCING POLISHING PAD
摘要 The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
申请公布号 US2008047205(A1) 申请公布日期 2008.02.28
申请号 US20070859928 申请日期 2007.09.24
申请人 SAN FANG CHEMICAL INDUSTRY CO., LTD. 发明人 FENG CHUNG-CHIH;YAO I-PENG;HUNG YUNG-CHANG
分类号 B24D3/34 主分类号 B24D3/34
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