METHOD OF FORMING METAL LINE AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE BY USING THE SAME
摘要
A method of forming a metal line and a method of manufacturing a display substrate by using the same are provided to achieve low resistance and high definition of the display substrate, since an aluminum layer can be completely removed on the substrate. A method of forming a metal line comprises the steps of: successively depositing a low-resistance metal layer containing aluminum, and an upper layer containing molybdenum on a base substrate(101); forming a line-shaped photoresist pattern(140) on the upper layer; etching the upper layer with chlorinated compound gas containing one additional gas, by using the photoresist pattern as a mask; and etching the low-resistance metal layer by using the photoresist pattern as a mask.
申请公布号
KR20080033589(A)
申请公布日期
2008.04.17
申请号
KR20060099184
申请日期
2006.10.12
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
OH, MIN SEOK;KIM, SANG GAB;JEONG, YU GWANG;CHOI, SEUNG HA;CHIN, HONG KEE;CHOI, SHIN IL