| 摘要 |
The method and the devices according to the invention are aimed at optimizing the projection of a two-dimensional pattern onto the surface of a three-dimensional object. After having defined an original curve on the two-dimensional pattern and a projection curve (600, 800) on the surface of the three-dimensional object, a point of the pattern is selected (610, 810). The abscissa of the projection of the selected point is determined according to the abscissa of the selected point and according to a first projection ratio (615, 815). Likewise, the ordinate of the projection of the selected point is determined according to the ordinate of the selected point and according to a second projection ratio (620, 820). A projection plane is then determined. This projection plane comprises the point of the projection curve that is determined by the abscissa of the projection of the selected point. The projection of the selected point onto the surface of the three-dimensional object is determined according to the ordinate of the projection of the selected point, the intersection of the surface of the three-dimensional object with the plane of projection and the projection curve (625, 825). |
