发明名称 |
Semiconductor light emitting device having patterns |
摘要 |
A semiconductor light emitting device includes a substrate structure; a semiconductor layer disposed on the substrate structure, the semiconductor layer including a light emitting layer; and an electrode formed on a surface of the semiconductor layer, wherein a relatively coarse uneven portion and a relatively fine uneven portion are formed by a frost process on a surface of the semiconductor layer at a side of the electrode. |
申请公布号 |
US9349916(B2) |
申请公布日期 |
2016.05.24 |
申请号 |
US201514798706 |
申请日期 |
2015.07.14 |
申请人 |
ROHM CO., LTD. |
发明人 |
Ito Yohei |
分类号 |
H01L29/06;H01L33/24;H01L33/06;H01L33/00;H01L33/22;H01L33/38;H01L33/60 |
主分类号 |
H01L29/06 |
代理机构 |
Rabin & Berdo, P.C. |
代理人 |
Rabin & Berdo, P.C. |
主权项 |
1. A method of manufacturing a semiconductor light emitting device, the method comprising:
forming a substrate structure; forming a semiconductor layer on the substrate structure, the semiconductor layer including a light emitting layer; forming an electrode on a surface of the semiconductor layer; and performing a frost process on the surface of the semiconductor layer to form a frost-processed layer including a rough uneven portion and a microstructural uneven portion on the surface of the semiconductor layer at a side of the electrode, the performing the frost process includes performing a first frost process to form the rough uneven portion and performing a second frost process to form the microstructural uneven portion. |
地址 |
Kyoto JP |