发明名称 Semiconductor light emitting device having patterns
摘要 A semiconductor light emitting device includes a substrate structure; a semiconductor layer disposed on the substrate structure, the semiconductor layer including a light emitting layer; and an electrode formed on a surface of the semiconductor layer, wherein a relatively coarse uneven portion and a relatively fine uneven portion are formed by a frost process on a surface of the semiconductor layer at a side of the electrode.
申请公布号 US9349916(B2) 申请公布日期 2016.05.24
申请号 US201514798706 申请日期 2015.07.14
申请人 ROHM CO., LTD. 发明人 Ito Yohei
分类号 H01L29/06;H01L33/24;H01L33/06;H01L33/00;H01L33/22;H01L33/38;H01L33/60 主分类号 H01L29/06
代理机构 Rabin & Berdo, P.C. 代理人 Rabin & Berdo, P.C.
主权项 1. A method of manufacturing a semiconductor light emitting device, the method comprising: forming a substrate structure; forming a semiconductor layer on the substrate structure, the semiconductor layer including a light emitting layer; forming an electrode on a surface of the semiconductor layer; and performing a frost process on the surface of the semiconductor layer to form a frost-processed layer including a rough uneven portion and a microstructural uneven portion on the surface of the semiconductor layer at a side of the electrode, the performing the frost process includes performing a first frost process to form the rough uneven portion and performing a second frost process to form the microstructural uneven portion.
地址 Kyoto JP