| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure apparatus technologies capable of suppressing occurrences of exposure failures, since, on a liquid exposure apparatus, when an optical member to emit exposure light fluctuates, exposure failures occur.SOLUTION: The exposure apparatus includes: a projection optical system emitting surface 32, from which exposure light EL is emitted; a liquid immersion member 4A, forming a liquid immersion space LS through which the exposure light EL passes, at least part of which is a movable member 42; a suppression system 432, for suppressing fluctuation of pressure of a liquid LQ in at least part of the liquid immersion space LS caused by a movement of the movable member 42; and a controller for controlling the suppression system.SELECTED DRAWING: Figure 12 |
