发明名称 METHOD FOR FORMING PHOTO-SOLDER RESIST AND SEMICONDUCTOR PACKAGE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor package substrate in which a solder diameter that connects a semiconductor and the semiconductor package substrate is not decreased in a multi-exposure part, and a method for manufacturing the semiconductor package substrate.SOLUTION: A method for forming a photo-solder resist pattern to be formed on an outermost surface of a semiconductor package substrate 10 is provided, which includes the steps of: thermally crosslinking a surface layer of an uncrosslinked photo-solder resist layer 13; directly exposing the photo-solder resist layer except for a portion to be removed, by use of a direct image exposure device; peeling an insulating resin protective film 14 and then developing to form a photo-solder resist layer having an opening formed therein; and heating the photo-solder resist layer having the opening formed therein and then exposing the whole surface of the layer.SELECTED DRAWING: Figure 1
申请公布号 JP2016131226(A) 申请公布日期 2016.07.21
申请号 JP20150005634 申请日期 2015.01.15
申请人 TOPPAN PRINTING CO LTD 发明人 KOGA OSAMU;HAYASHI AKIHIRO
分类号 H01L23/12;H05K3/28 主分类号 H01L23/12
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