| 摘要 |
<p>The invention describes a CVD reactor on solid substrates and a related method of deposition of epitaxial layers on the wafers. In the reactor of the invention, the wafer carrier (110) is transported between a loading position (L) and a deposition position (D). In the deposition position, the wafer carrier is detachably mounted on an upper end of a rotatable spindle (120) without an intermediate susceptor. The reactor of the invention may process a single wafer or a plurality of wafers at the same time. The invention also describes several embodiments and variants of the invention. One of the variants of the invention provides a decrease in a heat drain from the wafer-supporting assembly through the spindle (500) and a novel heating arrangement therefor. The advantages of the invention include lower reactor cycle, the lower cost and longer lifetime of the component parts, and better temperature control, among others.</p> |
