PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern by which a resist pattern having superior features can be formed by using actinic rays except for laser light in a direct drawing process.

SOLUTION: The method for forming a resist pattern includes: a step of forming a photosensitive resin composition layer comprising a binder polymer, a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator expressed by the general formula (1) on a substrate; an exposure step of directly drawing a pattern in a region of at least a part of the layer by use of actinic rays prepared by at least partially eliminating light at a wavelength of 350 nm or shorter from light from various types of light sources, to form a photo-cured portion; and a development step of removing a region except for the photo-cured portion.

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