发明名称 Electroplating apparatus and process for wafer level packaging
摘要 An apparatus for continuous simultaneous electroplating of two metals having substantially different standard electrodeposition potentials (e.g., for deposition of Sn—Ag alloys) comprises an anode chamber for containing an anolyte comprising ions of a first, less noble metal, (e.g., tin), but not of a second, more noble, metal (e.g., silver) and an active anode; a cathode chamber for containing catholyte including ions of a first metal (e.g., tin), ions of a second, more noble, metal (e.g., silver), and the substrate; a separation structure positioned between the anode chamber and the cathode chamber, where the separation structure substantially prevents transfer of more noble metal from catholyte to the anolyte; and fluidic features and an associated controller coupled to the apparatus and configured to perform continuous electroplating, while maintaining substantially constant concentrations of plating bath components for extended periods of use.
申请公布号 US9404194(B2) 申请公布日期 2016.08.02
申请号 US201113305384 申请日期 2011.11.28
申请人 Novellus Systems, Inc. 发明人 Mayer Steven T.;Porter David W.
分类号 C25D21/12;C25D21/14;C25D21/18;C25D7/12;C25D3/60;C25D17/00;C25D3/56;C25D5/02;C25C1/20;C25C7/00 主分类号 C25D21/12
代理机构 Weaver Austin Villeneuve & Sampson LLP 代理人 Weaver Austin Villeneuve & Sampson LLP
主权项 1. A continuous method of simultaneously plating a first metal and a second more noble metal onto a cathodic substrate, the method comprising: (a) providing an anolyte containing ions of the first metal but not the second metal in an anode chamber comprising an active anode comprising the first metal; (b) providing a catholyte containing ions of both the first metal and the second metal in a cathode chamber, wherein the anode chamber and the cathode chamber are separated by a separation structure therebetween; and (c) simultaneously plating the first and the second metal onto the substrate, while substantially preventing ions of the second metal from entering the anode chamber, while delivering an acid solution to the anode chamber from a source outside the anode chamber, while delivering a solution comprising ions of the first metal to the anode chamber from a source outside the anode chamber, while removing a portion of the catholyte to make room for a volume of fluid material that is transferring from the anode chamber to the cathode chamber, while delivering ions of the second metal to the cathode chamber, while transporting water through the separation structure from the anolyte to the catholyte; and while delivering anolyte from the anode chamber to the cathode chamber via a conduit other than the separation structure, wherein the volume of fluid material that is transferring from the anode chamber to the cathode chamber comprises water volume transported through the separation structure from the anolyte to the catholyte, and the anolyte volume delivered from the anode chamber to the cathode chamber via the conduit other than the separation structure; and wherein the catholyte and anolyte comprise acid and wherein the concentration of protons in the catholyte is maintained such that it does not fluctuate by more than about 10% over the period of at least about 0.2 bath charge turnovers.
地址 Fremont CA US