System and method for generating extreme ultraviolet light

摘要

A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

主权项

1. A system for generating extreme ultraviolet light, comprising:
a chamber; a target supply device configured to supply a target material to a specific region in the chamber; a first laser apparatus configured to output a first laser beam to irradiate the target material; an optical system configured to focus the first laser beam outputted from the first laser apparatus; a detector configured to detect a backpropagating beam of the first laser beam reflected by the target material; and a controller configured to control a focus position of the optical system based on the backpropagating beam detected by the detector.