发明名称 PHOTOCURABLE COMPOSITION
摘要 [Problem] It has been difficult for a conventional photocurable composition to secure adhesion force to a material that hardly adheres and to maintain the adhesion force even after humidity test or heat cycle test. [Solution] A photocurable composition which comprises Components (A) to (D), but does not comprise a (meth)acrylic monomer having one (meth)acrylic group other than component (B), wherein the photocurable composition comprises 100 to 300 parts by mass of component (B) with respect to 100 parts by mass of component (A): Component (A) : a block copolymer of styrene polymer and ethylene/butylene polymer, Component (B): a (meth)acrylic monomer having a hydrocarbon group and a (meth)acrylic group, Component (C): a compound having two or more thiol groups, and Component (D): a photoinitiator.
申请公布号 PH12015000107(A1) 申请公布日期 2017.01.30
申请号 PH2007120150001 申请日期 2015.04.10
申请人 THREE BOND FINE CHEMICAL CO., LTD. 发明人 JUNYA IWASAWA
分类号 C08F2/44;C08F2/48;C09J4/02;C09J153/00 主分类号 C08F2/44
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