| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that can significantly reduce pattern collapse, development defects, immersion defects (water residue defects and bubble defects), and scum, and that is useful for forming a fine pattern in manufacturing semiconductors, and a pattern forming method using the resin composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition has such properties that a surface of a film formed of the actinic ray-sensitive or radiation-sensitive resin composition shows a receding contact angle of 65° or more with water, and that the surface of the film after being treated with an alkali developer shows a receding contact angle of 35° or less with water. The pattern forming method is carried out by using the above resin composition. |
