发明名称 LIGHT-SHIELDING MEMBER, METHOD OF MANUFACTURING LIGHT-SHIELDING MEMBER, ULTRAVIOLET ABSORPTION FILM, INFRARED ABSORPTION FILM, PHOTOMASK, AND ELECTROMAGNETIC-WAVE SHIELDING FILM
摘要 <p>A light shielding member having an excellent surface hardness, a manufacturing method thereof, an ultraviolet absorption film, an infrared absorption film, a photo mask, and an electromagnetic wave shielding film are provided to improve a surface hardness and a light shielding performance of a light fastness etc by forming a light shielding member including a polymer layer by a surface graft polymerization. A compound having an unsaturated part and a part absorbing a metal ion or a metal salt is contacted on a member capable of generating a radical by a light. A polymer layer coupled on the member is generated by performing an exposure process. A metal ion or a metal salt is supplied to the polymer layer. A metal particle is educed by reducing the metal ion among the metal ion and the metal salt. One among a multivalent metal cross-linking process, a chemical modification, and an acid process is performed about a metal salt structure of one valence.</p>
申请公布号 KR20090028430(A) 申请公布日期 2009.03.18
申请号 KR20080089197 申请日期 2008.09.10
申请人 FUJIFILM CORPORATION 发明人 MATSUSHITA YASUAKI
分类号 H01L21/027;B32B5/16;B32B15/08;C03C17/38;C23C18/18;G03F1/54;G03F1/56 主分类号 H01L21/027
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