POLYSILANE SILICA-ALKALI SOLUBLE RESIN HYBRID MATERIAL, ITS PRODUCTION AND ANTIREFLECTION FILM MATERIAL

摘要

PROBLEM TO BE SOLVED: To obtain the subject material capable of forming uniform films having antireflection film characteristics and no defects and useful as the main agent of a antireflection film material. SOLUTION: The subject hybrid material comprises (A) an alkali soluble resin and (B) a polysilane silica component expressed by formula I [R is a monovalent hydrocarbon; (n) is an average value of 1-3] interlacing to each other in molecular level. The ingredient A is preferably a novolak resin expressed by formula II [(p) is an average value of 1-3; (q) is a number bringing a polystyrene-converted average molecular weight to be 500-30000]. The hydrid material is obtained by reacting an organooxypolysilane expressed by formula III [R' is a monovalent hydrocarbon; (m) is 0-4 integer] in a solution in which the ingredient A is dissolved. Thus, it is expected to improve dry etching resistance of resist patterns by protecting halation and tailing of resist films.