发明名称 FORMATION OF FUNCTION COATING FILM
摘要 PROBLEM TO BE SOLVED: To form a functional coating film having a stripe-shaped, lattice- shaped, or other fine pattern precisely by using a phenomenon in which the film thickness of a recessed part becomes larger than that of a projected part on a substrate by uneven structure. SOLUTION: The whole coating film formed by applying a positive photoresist on the whole transparent polystyrene substrate having saw blade- shaped structure is subjected to exposure by using an exposure machine using an extra-high voltage mercury lamp as a light source. After the exposure, it is immersed in a developing solution, the exposed part is removed, and a positive photoresist coating film is formed in the recessed part of the substrate by pure water-rinsing and air blow-drying. The substrate having the positive photoresist coating film is heated in an oven, and a negative photoresist is applied on the whole surface of the substrate to form a coating film. The whole surface of the substrate is subjected to exposure from the back by using the extra-high voltage mercury lamp as a light source. The substrate is developed by immersing in a developing solution, the uncured part is removed, and a functional coating film is formed in the top part of the saw blade-shaped structure of the substrate by pure water-rinsing and air blow-drying.
申请公布号 JP2000042481(A) 申请公布日期 2000.02.15
申请号 JP19980217305 申请日期 1998.07.31
申请人 SUMITOMO CHEM CO LTD 发明人 IIMURA KIYOHISA;MIYAZAKI SUSUMU;FUJISAWA KOICHI
分类号 G02B5/00;B05D1/32;G02F1/1335 主分类号 G02B5/00
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