| 摘要 |
<p>A reference glass board (8B) whereupon a reference pattern (P) to be an exposure position reference is previously formed is arranged on a lower side of a glass board (8A), and is transferred in an arrow A direction by a transfer means (4). The reference pattern (P) is illuminated from the lower part of the transfer means (4) by the illuminating means (6), and an image of the reference pattern (P) is picked up by an image pickup means (5) arranged on an upper part of the transfer means (4). An optical system control means (7) detects a reference position previously set to the reference pattern (P) of which the image is picked up by the image pickup means (5), and controls irradiation start or irradiation stop of laser beams, having the reference position as a reference. Then, a pixel of a black matrix to be a reference of a functional pattern formed by being laminated on the glass board (8A) is exposed at a prescribed position on the glass board (8A). Thus, alignment accuracy of the functional pattern is improved and cost increase of an exposure apparatus is suppressed. ® KIPO & WIPO 2007</p> |
