LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM

摘要

A laminate which comprises a first silica-based film, a second silica- based film and an organic film, wherein the second silica-based film has a mono-valent organic group containing a carbon-carbon double bond or a carbon-carbon triple bond; a method for forming the above laminate which comprises forming a first coating film for the first silica-based film on a substrate, forming a second coating film having a mono-valent organic group containing a carbon-carbon double bond or a carbon-carbon triple bond for the second silica-based film on the first coating film, forming a third coating film for the organic film on the second coating film, and then curing a laminated film comprising the above first to third coating films; an insulating film; a semiconductor device; and a composition for forming the film. The above laminate has a low dielectric constant, and also is excellent in the adhesiveness between the films. ® KIPO & WIPO 2007