| 摘要 |
A method for manufacturing a flat display device is provided to be enable to omit an exposing process, a developing process, and an etching process, thereby reducing the manufacturing cost, by forming a thin film pattern using a soft mold, a dissolved nanopowder gate electrode material, etc. A conductive nanopowder thin film material is prepared by dissolving a first conductive nanopowder(259a) having a first oxidation enthalpy and a second conductive nanopowder(259b) having a second oxidation enthalpy higher than the first oxidation enthalpy in a solvent. The conductive nanopowder thin film material is spread on a substrate(182). A conductive thin film pattern is formed by pattern-etching the conductive nanopowder thin film material. A conductive thin film(259) is formed by hardening the conductive thin film pattern. The first conductive nanopowder is located at the center of the conductive thin film, and the second conductive nanopowder is located in an outer region of the conductive thin film. |
