发明名称 MASKLESS EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To set a relative angle between a DMD (spatial optical modulator) and a substrate with high accuracy in an inexpensive configuration. <P>SOLUTION: A rotating table 13 the rotation center of which can be moved in XY directions is provided and a substrate 6 as an exposure object is mounted on the rotating table 13 and preliminarily rotated by a predetermined angle &theta; with respect to the Y axis prior to starting exposure. The substrate 6 in the rotated state is subjected to XY axes complementary control so as to draw a pattern on the substrate 6 by exposure by subjecting each mirror M of the DMD 3 to on-off control based on time-series exposure data while the substrate 6 is inclined in the direction of the angle. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007219011(A) 申请公布日期 2007.08.30
申请号 JP20060036961 申请日期 2006.02.14
申请人 HITACHI VIA MECHANICS LTD 发明人 NAITO YOSHITATSU;SATO KOICHI;SAJIKI KOJI;NISHIJIMA OSAMU;IKEGAMI HITOSHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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