发明名称 |
MASKLESS EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To set a relative angle between a DMD (spatial optical modulator) and a substrate with high accuracy in an inexpensive configuration. <P>SOLUTION: A rotating table 13 the rotation center of which can be moved in XY directions is provided and a substrate 6 as an exposure object is mounted on the rotating table 13 and preliminarily rotated by a predetermined angle θ with respect to the Y axis prior to starting exposure. The substrate 6 in the rotated state is subjected to XY axes complementary control so as to draw a pattern on the substrate 6 by exposure by subjecting each mirror M of the DMD 3 to on-off control based on time-series exposure data while the substrate 6 is inclined in the direction of the angle. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007219011(A) |
申请公布日期 |
2007.08.30 |
申请号 |
JP20060036961 |
申请日期 |
2006.02.14 |
申请人 |
HITACHI VIA MECHANICS LTD |
发明人 |
NAITO YOSHITATSU;SATO KOICHI;SAJIKI KOJI;NISHIJIMA OSAMU;IKEGAMI HITOSHI |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|