发明名称 NOVEL COMPOUND
摘要 A novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound is represented by the following formula (1). In the formula, R1 and R2 each independently represents a hydrogen atom or an organic group, but at least one represents an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 represents a single bond or an organic group. R4 to R9 each independently represents a hydrogen atom, an organic group, etc., but R6 and R7 are not hydroxyl groups. R10 represents a hydrogen atom or an organic group.;
申请公布号 US2016170302(A1) 申请公布日期 2016.06.16
申请号 US201615053246 申请日期 2016.02.25
申请人 TOKYO OHKA KOGYO CO., LTD. ;DAICEL CORPORATION 发明人 SHIOTA Dai;KUROKO Mayumi;NODA Kunihiro;TADOKORO Yoshinori;AKAI Yasuyuki;TAKAI Hideyuki
分类号 G03F7/085;G03F7/004 主分类号 G03F7/085
代理机构 代理人
主权项 1. A method for generating a base by irradiating with an electromagnetic wave, or by heating, a compound represented by the following formula (1): wherein R1 and R2 each independently represents a hydrogen atom or an organic group, provided that at least one of R1 and R2 represents an organic group; R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond; R3 represents a single bond or an organic group; R4 and R5 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, or an organic group; R6, R2, R8, and R9 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group, provided that R6 and R2 are not hydroxyl groups; two or more of R6, R7, R8, and R9 may be bonded to form a ring structure and may contain a hetero atom bond; and R10 represents a hydrogen atom or an organic group.
地址 Kawasaki-shi JP