| 发明名称 |
MORPHOLINE BATH AND METHOD FOR CHEMICALLY DEPOSITING A LAYER |
| 摘要 |
A chemical bath for depositing a layer made from at least metal and sulphur is described. Furthermore, a method for depositing such a layer is described. This bath comprises, in solution: a metal salt comprising a metal chosen from at least one of the elements from groups IIB and MA of the periodic table; and a sulphur precursor. The bath further comprises a morpholine compound. |
| 申请公布号 |
US2016312347(A1) |
申请公布日期 |
2016.10.27 |
| 申请号 |
US201515103694 |
申请日期 |
2015.02.12 |
| 申请人 |
ELECTRICITE DE FRANCE ;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS - |
发明人 |
HILDEBRANDT Thibaud;NAGHAVI Negar;LOONES Nicolas;SCHNEIDER Nathanaelle |
| 分类号 |
C23C2/04 |
主分类号 |
C23C2/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chemical bath for depositing a layer based on at least metal and sulfur, the chemical bath comprising, in a solution:
a metal salt comprising a metal selected from among at least one of the elements of groups IIB and IIIA of the periodic table; and a sulfur precursor; wherein the chemical bath further comprises a morpholine compound. |
| 地址 |
Paris FR |
