| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a novel compound which exhibits excellent drainability of a resist film surface in exposure in a liquid immersion exposure process and suppresses the generation of development defects; a polymer having a structural unit originated from the compound; and a photoresist composition containing the polymer. <P>SOLUTION: The polymer has a structural unit originated from a compound represented by formula (1). The photoresist contains (A) a polymer having an acid-dissociative group, (B) the polymer, (C) an acid generator, and (D) a solvent. In formula (1), R<SP POS="POST">4</SP>and R<SP POS="POST">5</SP>are each independently a hydrogen atom or a 1-20C monovalent organic group; at least one of R<SP POS="POST">4</SP>and R<SP POS="POST">5</SP>has a fluorine atom; and n is an integer of 1 to 4. <P>COPYRIGHT: (C)2013,JPO&INPIT |
