| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma processor ensuring a higher removing effect for deposited aluminum substance to effectively remove the deposited aluminum substance and also provide a plasma processor, a control program, and a computer storage medium. <P>SOLUTION: In the cleaning for removing deposited aluminum substance, a mixed gas of Cl<SB>2</SB>/N<SB>2</SB>is supplied to a processing chamber 1 as the cleaning gas from a gas supplying system 15. A high-frequency power of the predetermined frequency (for example, 100 MHz) is supplied to a work setting board 2 as a lower electrode from a first RF power supply 10a in order to generate plasma of cleaning gas and remove the deposited aluminum substance with this plasma. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
