Titania-doped quartz glass and making method

摘要

Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

主权项

1. A method for manufacturing a titania-doped quartz glass, comprising the steps of:
mixing a silicon-providing reactant gas and a titanium-providing reactant gas, heating the reactant gas mixture at 200 to 400° C., subjecting the mixture to oxidation or flame hydrolysis with the aid of a combustible gas and a combustion-supporting gas, depositing a titania doped quartz glass, and forming an EUV lithography member having a surface for reflecting EUV light, the surface being free of concave defects having a volume of at least 30,000 nm3 and an aspect ratio of up to 10 in an effective region.