发明名称 |
Plasma Deposition Process with Removal of Substrate Tube |
摘要 |
Disclosed are methods for manufacturing a precursor for a primary preform for optical fibers via an internal plasma deposition process. An exemplary method includes creating a first plasma reaction zone having first reaction conditions in the interior of a hollow substrate tube to deposit non-vitrified silica layers on the inner surface of the hollow substrate tube, and subsequently creating a second plasma reaction zone having second reaction conditions in the interior of the hollow substrate tube to deposit vitrified silica layers on the deposited, non-vitrified silica layers. Thereafter, the hollow substrate tube is removed from the deposited, vitrified silica layers to yield a deposited tube. |
申请公布号 |
US2016186316(A1) |
申请公布日期 |
2016.06.30 |
申请号 |
US201514985961 |
申请日期 |
2015.12.31 |
申请人 |
Draka Comteq B.V. |
发明人 |
Milicevic Igor;Hartsuiker Johannes Antoon;van Stralen Mattheus Jacobus Nicolaas;Krabshuis Gertjan |
分类号 |
C23C16/01;C23C16/40 |
主分类号 |
C23C16/01 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a precursor for a primary preform for optical fibers via an internal plasma deposition process, the method comprising the following steps:
i) providing a hollow substrate tube; ii) creating a first plasma reaction zone having first reaction conditions in the interior of the hollow substrate tube by means of electromagnetic radiation to deposit non-vitrified silica layers on the inner surface of the hollow substrate tube; iii) creating a second plasma reaction zone having second reaction conditions in the interior of the hollow substrate tube by means of electromagnetic radiation to deposit vitrified silica layers on the non-vitrified silica layers deposited in step ii); and iv) removing the hollow substrate tube from the vitrified silica layers deposited in step iii) to obtain a deposited tube. |
地址 |
Amsterdam NL |