| 发明名称 |
MAGNETRON-SPUTTERING COATING SYSTEM AND METHOD, AND DISPLAY SUBSTRATE |
| 摘要 |
It is provided a magnetron-sputtering coating system including a sputtering chamber. The sputtering chamber therein includes: a set of target, formed by concatenating a plurality pieces of target; a substrate carrier, arranged to be opposite to the target set, and support a substrate to be coated with a film; and a driving device, arranged to drive the substrate carrier to reciprocate in a direction of the arrangement of the target. |
| 申请公布号 |
US2016186312(A1) |
申请公布日期 |
2016.06.30 |
| 申请号 |
US201514731544 |
申请日期 |
2015.06.05 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
WANG Xiaokun;PARK Sangsoo;ZHANG Xunze;WANG Zhaobo;SHA Lei;CHENG Guanjie;ZHANG Wenjun;WANG Hualu;WEN Qingliang;LV Leilei |
| 分类号 |
C23C14/34;H01J37/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A magnetron-sputtering coating system, comprising:
a sputtering chamber, wherein in the sputtering chamber, the magnetron-sputtering coating system further comprises:
a target set consisting of a plurality of targets;a substrate carrier, arranged opposite to the target set, and configured to support a substrate to be coated with a film; anda driving device, configured to drive the substrate carrier to reciprocate in an arrangement direction of the targets. |
| 地址 |
Beijing CN |
