| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target held stably on a base material while preventing the cracking of a sputtering target material.SOLUTION: A cylindrical type sputtering target comprises: a cylindrical type base material made of a metal; a plurality of cylindrical type sputtering target materials mounted on the cylindrical type base material; and a joint material interposed between the cylindrical type base material and the cylindrical type sputtering target materials. The cylindrical type sputtering target materials contain indium (In). The joint material contains indium (In) and a second metal element other than indium (In). Each of the cylindrical type sputtering target materials is mounted through a clearance on the cylindrical type base material so that the joint material is exposed to the portion of the clearance.SELECTED DRAWING: Figure 1 |
