发明名称 PRODUCTION OF MOLDED SUBSTRATE HAVING FINE GROOVE
摘要 PROBLEM TO BE SOLVED: To provide technique capable of molding a molded substrate having groove width finer than the min. groove width formable by exposure light same in wavelength while using this exposure light. SOLUTION: Exposure light is applied to a positive photoresist 2 (a replica is unnecessary in the case of a negative photoresist) along a first line O1 (an irradiation region 2e corresponds to a land) in order to form a first land corresponding part and this exposure light is parallelly moved to a second line O2 separated from the first line by 'groove width Gw+land width Lw'. Next, exposure light is applied to the resist along the second line in order to form a second land corresponding part and the irradiated resist is developed to obtain a master. A replica is produced from the master and a stamper is produced from the replica by an electroforming method and used to produce a molded substrate from glass or a resin by injection molding or press molding. By this constitution, Gw is determined by the parallel moving quantity of exposure light and Gw of 0.1-0.01 μm also becomes possible.
申请公布号 JP2000334744(A) 申请公布日期 2000.12.05
申请号 JP19990153278 申请日期 1999.06.01
申请人 NIKON CORP 发明人 NISHIYAMA MADOKA;MORITA SEIJI
分类号 B29C33/38;B29C45/26;B29D17/00;C25D1/10;G11B5/82;G11B5/84;G11B7/24;G11B7/26 主分类号 B29C33/38
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