发明名称 |
PRODUCTION OF MOLDED SUBSTRATE HAVING FINE GROOVE |
摘要 |
PROBLEM TO BE SOLVED: To provide technique capable of molding a molded substrate having groove width finer than the min. groove width formable by exposure light same in wavelength while using this exposure light. SOLUTION: Exposure light is applied to a positive photoresist 2 (a replica is unnecessary in the case of a negative photoresist) along a first line O1 (an irradiation region 2e corresponds to a land) in order to form a first land corresponding part and this exposure light is parallelly moved to a second line O2 separated from the first line by 'groove width Gw+land width Lw'. Next, exposure light is applied to the resist along the second line in order to form a second land corresponding part and the irradiated resist is developed to obtain a master. A replica is produced from the master and a stamper is produced from the replica by an electroforming method and used to produce a molded substrate from glass or a resin by injection molding or press molding. By this constitution, Gw is determined by the parallel moving quantity of exposure light and Gw of 0.1-0.01 μm also becomes possible. |
申请公布号 |
JP2000334744(A) |
申请公布日期 |
2000.12.05 |
申请号 |
JP19990153278 |
申请日期 |
1999.06.01 |
申请人 |
NIKON CORP |
发明人 |
NISHIYAMA MADOKA;MORITA SEIJI |
分类号 |
B29C33/38;B29C45/26;B29D17/00;C25D1/10;G11B5/82;G11B5/84;G11B7/24;G11B7/26 |
主分类号 |
B29C33/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|