发明名称 METHOD OF FORMING CONDUCTIVE PATTERN
摘要 PROBLEM TO BE SOLVED: To form a conductive pattern, while thinning and flattening the conductive pattern by repeating the formation by electroplating and polishing of the conductive pattern. SOLUTION: The method of forming the conductive pattern comprises a process of forming a mask pattern 16 so as to expose only a desired region on the surface of a conductive layer 15 formed on the surface of an insulating base material 10; a process of forming the conductive pattern 17 on the exposed surface of the conductive layer 15; a process of polishing the surface of the conductive pattern 17; and a process of forming the conductive layer further on the polished surface of the conductive pattern 17. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007243097(A) 申请公布日期 2007.09.20
申请号 JP20060067164 申请日期 2006.03.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SUGAWA TOSHIO;IWAZAWA AYAKO
分类号 H05K3/26;H05K3/40 主分类号 H05K3/26
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