发明名称 |
ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ablation layer having such properties that: the layer is not wrinkled by moisture absorption in a high humidity environment even after peeling off a cover film stuck to the ablation layer; a portion of the layer that has been removed with a developing solution can be easily dissolved and dispersed; retention or re-adhesion of a washing residue can be effectively prevented; and the layer can be processed with IR rays. <P>SOLUTION: The ablation layer to be used for a photosensitive resin for relief printing can be processed with IR rays and contains an anionic polymer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013101394(A) |
申请公布日期 |
2013.05.23 |
申请号 |
JP20130024700 |
申请日期 |
2013.02.12 |
申请人 |
ASAHI KASEI E-MATERIALS CORP |
发明人 |
ISO TOMOSATO |
分类号 |
G03F7/095;G03F7/00;G03F7/004;G03F7/32 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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