| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint apparatus which is advantageous for improving the overlay accuracy between a mold and a resin on a substrate. <P>SOLUTION: An imprint method includes: a holding process where a substrate is held on a holding surface; a deformation process where a shape of a substrate side pattern region on the substrate, which a pattern is formed, is deformed; a contact process where a resin on the deformed substrate side pattern region is placed in contact with a mold; a hardening process where the resin is hardened; and a mold releasing process where the resin and the mold, which contact with each other, are separated. In the deformation process, an imprint apparatus causes a deformation force, which is larger than the maximum static friction force acting between a rear surface of the substrate corresponding to the substrate side pattern region and the holding surface, to act in a direction along a surface of the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
