发明名称 MATERIAL FOR FORMING ELECTROLESS PLATING AND METHOD FOR MANUFACTURING ELECTROLESSLY PLATED NON-ELECTROCONDUCTIVE BASE MATERIAL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a material for forming an electroless plating, which has good catalyst sticking property and from which a catalyst sticking layer is not eluted into a plating solution in a catalyst sticking process, a developing process or the like. <P>SOLUTION: In the material for forming the electroless plating, having the catalyst sticking layer on a non-electroconductive base material, the catalyst sticking layer contains a hydrophilic ionization radiation-curable resin composition and the surface of the catalyst sticking layer is formed to have a contact angle to deionized water of≤60°. Preferably, the catalyst sticking layer is formed so that the hydrophilic ionization radiation-curable resin composition exists in a half-cured state in the layer. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008308762(A) 申请公布日期 2008.12.25
申请号 JP20080123614 申请日期 2008.05.09
申请人 KIMOTO & CO LTD 发明人 KITAMURA YOSHIKO;SHIMIZU KOJI;NAKATANI MASAYUKI;OTA TETSUJI
分类号 C23C18/18;C23C18/20;H05K3/18 主分类号 C23C18/18
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