发明名称 METHOD FOR MANUFACTURING LIQUID JET HEAD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid jet head which can improve manufacturing efficiency. SOLUTION: The method comprises forming a piezoelectric element 300 on one face of a wafer 110 for a flow passage-forming substrate, joining a wafer 130 for a protective substrate on the one face, covering a through-hole 33 and an opening of a reservoir part 31 with a protective film 140 together with drive wiring 120 under a pressure lower than the atmospheric pressure, then adsorbing the protective film 140 on the wafer 130 for the protective substrate side by placing these wafers 110 and 130 under the atmospheric pressure, adhering a KOH resistant film 150 to the periphery of the wafer 130 for the protective substrate by an adhesive 151 so as to cover the protective film 140, etching the wafer 110 for the flow passage-forming substrate to form a pressure generation chamber 12, removing the KOH resistant film 150 and the protective film 140, and dividing the wafer 110 for the flow passage-forming substrate and the wafer 130 for the protective substrate into a predetermined size. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009132042(A) 申请公布日期 2009.06.18
申请号 JP20070310008 申请日期 2007.11.30
申请人 SEIKO EPSON CORP 发明人 TAKIMOTO ISAO;NAGATE TORU
分类号 B41J2/16 主分类号 B41J2/16
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